http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101564473-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32138 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2008-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2015-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2015-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101564473-B1 |
| titleOfInvention | Method of controlling etch microloading for a tungsten-containing layer |
| abstract | A method is provided for etching features of different aspect ratios in a tungsten-containing layer. An etching gas containing a tungsten etching component and a deposition component is provided. A plasma is formed from the provided etching gas. A tungsten-containing layer patterned with a wide feature and a narrow feature is etched by the provided plasma. |
| priorityDate | 2007-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 37.