http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101563777-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02263 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-509 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4554 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02219 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate | 2013-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2015-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2015-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101563777-B1 |
| titleOfInvention | Film formation apparatus and film formation method |
| abstract | A separation area is provided between the first processing area and the second processing area when viewed from the wafer revolving by the rotary table and the second processing area when viewed from the wafer revolved by the rotation table and Between one processing region, a modified region for modifying the reaction product on the wafer is arranged by the plasma generating section. The protrusion of the housing is disposed so as to surround the modified region, and the atmosphere of the third processing region is set to a higher pressure than that of the atmosphere adjacent to the third processing region. |
| priorityDate | 2012-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 24.