| abstract |
(i) two or more repeating units selected from the following units: Wherein R 61 , R 62 , R 63 and R 65 are each individually selected from hydrogen or C 1-4 alkyl; R 64 is C 1-4 alkyl; And (Ii) at least one additional repeating unit selected from the following units: Wherein R 61 , R 62 , R 63 , R 64 and R 65 are each independently selected from hydrogen or C 1-4 alkyl and n is a number from 0 to 3, Is useful as a component of a photoresist composition. |