http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101537031-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3f09bfc4cef94f1e366b09d1ca84b6d6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dc59a84619bc1161fa84dda1cdb65433 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2001-427 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2300-00 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D61-485 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J5-20 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D61-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-20 |
| filingDate | 2014-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2015-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_97a9c4b735203a97b1e18c7dd2557d44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a2dee37eafc43f43b6e15c55e622fc3 |
| publicationDate | 2015-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101537031-B1 |
| titleOfInvention | An ion exchange resin removing boron and phosphorus and production method thereof |
| abstract | The present invention relates to a method for manufacturing an ion exchange resin for removing boron and phosphorus, which is a method for manufacturing an ion exchange resin, to be used for an ultrapure water production apparatus. The provided method for manufacturing an ion exchange resin for removing boron (B) and phosphorus (P) comprises the steps of: mixing positive ion and negative ion resins at a ratio of 1:1 in a reactor; applying heat to the mixed resins which are mixed at a ratio 1:1 in the reactor to be polymerized; injecting the mixed resins, after the polymerization, into an etching system to perform etching and stirring processes; forming fine grooves on grains of the mixed resins through the etching and stirring processes; and using de-ionized water (DIW) and nitrogen (N_2) gas to cleanse the mixed resins formed with fine grooves. According to the present invention, resins are processed through polymerization to be transformed into grains consisting of large particles, and then inorganic ions such as B, P and the like are coupled to the grooves formed on the surface of the particles formed through etching by using acid so as to be separated. In addition, compared to the case of using conventional resins, an adsorption rate of inorganic ions can be increased up to 90%, and inorganic ions such as B, P and the like can be removed to be 1 ppt or less. Furthermore, exhausted resins can be recycled several times through a reforming process to significantly reduce costs. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210090824-A |
| priorityDate | 2014-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 33.