http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101499598-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2323-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31663 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2479-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24355 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J7-043 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-293 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-043 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-10 |
| filingDate | 2010-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2015-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2015-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101499598-B1 |
| titleOfInvention | Photocurable dry film, method of the same, and pattern processing method and electric/electronic component protective coating |
| abstract | The photocurable resin composition used for forming the photocurable resin layer of the photocurable dry film having a structure sandwiched between the support film and the protective film is characterized by being a photocurable dry film containing the components (A) to (D) do. (A) a silicon skeleton-containing polymer compound having a repeating unit represented by the general formula (1) (B) an amino condensate modified with formalin or formalin-alcohol, a phenol compound having an average of at least two methylol groups or alkoxymethylol groups per molecule, (C) a light-oil acid generator which decomposes by light having a wavelength of 190 to 500 nm to generate an acid, (D) Solvent According to the present invention, it is possible to form a fine pattern in a wide wavelength region with respect to the above-mentioned photocurable resin layer having various thicknesses on a substrate having unevenness. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210019868-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102394251-B1 |
| priorityDate | 2009-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 410.