| abstract |
(A) An organosiloxane-based polymer compound having a repeating unit represented by the formula (1): (R 1 to R 4 are monovalent hydrocarbon groups, n is 1 to 1,000, X Is a group selected from the following formulas: (B) an amino condensate modified with formalin or formalin-alcohol, a phenol compound having an average of two or more methylol groups or alkoxymethylol groups in one molecule, and an average of two or more amino acids in one molecule Any one selected from epoxy compounds having an epoxy group Or more, (C) photoacid generator, (D) (R 11 ) m Si (O R 12 ) A photocurable resin composition containing 4-m or a partially hydrolyzed condensate thereof (R 11 is a monovalent hydrocarbon group, R 12 is an alkyl group, and m is an integer of 0 to 2). object. Effects By using the photocurable resin composition of the present invention, it is possible to form a pattern having excellent dry etching resistance. |