http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101458143-B1

Outgoing Links

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filingDate 2007-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2014-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2014-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101458143-B1
titleOfInvention Method of treatment, in particular, thin backside treatment of wafers, wafer-carrier arrangement and method of manufacturing wafer-carrier arrangement of this type
abstract The present invention relates to a wafer (1); A carrier layer system (5, 6); And a separation layer (4) provided between the carrier layer system (5,6) and the wafer (1), the carrier layer system (5,6) comprising (i) a carrier layer (6) (Iii) a plasma polymer layer, and (iv) an elastic layer (4) selected from a fully cured elastomer, a partially cured elastomer or a curable elastomer on one side of the separating layer, Carrier arrangement in which the adhesive force between the carrier layer system 5, 6 and the separating layer is greater than the adhesion force between the wafer and the separating layer after the substrate is fully cured.
priorityDate 2006-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 33.