| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8d0fc2b70675ee19bd5fc464f5ae9061 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B32-182
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31127
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2013-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2014-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1cca94baa7444c4666baa1ad9cef18e1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_730943f2cc84b221518b1a78f81fc65f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e4beb6896ef74516c5f5b23af0ffb032 |
| publicationDate |
2014-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101439030-B1 |
| titleOfInvention |
Method of forming a pattern structure |
| abstract |
In the method for forming the task structure, a graphene thin film pattern is formed on the etching target layer. Thereafter, the target layer pattern may be formed by partially etching the etching target layer using the graphene thin film pattern as an etching mask. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10495972-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10170325-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11086223-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10808142-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10133176-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10685844-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10153163-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10331033-B2 |
| priorityDate |
2013-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |