http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101420302-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2068 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-422 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-526 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K19-0403 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate | 2007-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2014-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101420302-B1 |
| titleOfInvention | Resist removing composition containing poly (cyanoalkyl) ethyleneamine and resist removing method using the composition |
| abstract | A composition for removing a resist, which exhibits excellent resist peeling property and is less susceptible to damage to a semiconductor or a flat panel display material, and a method for peeling a resist using the composition for removing a resist. N, N'-bis (2-cyanoethyl) -ethylenediamine, N, N'-bis (2-cyanoethyl) ethylenediamine as the poly (cyanoalkyl) ethyleneamine, (2-cyanoethyl) ethylenediamine, N, N'-bis (2-cyanoethyl) ethylenediamine, N, N'- N '- (2-cyanoethyl) -N' - (2-aminoethyl) 2-aminoethyl) piperazine, and the like.n n n Poly (cyanoalkyl) ethylene amines, compositions for removing resist, semiconductor integrated circuits |
| priorityDate | 2006-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 69.