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filingDate 2013-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2014-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d14d91df0d15015c6334cdba7b759ee0
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publicationDate 2014-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101384810-B1
titleOfInvention Thinner composition for photoresist rinse and purification method thereof
abstract The present invention relates to a thinner composition for photoresist rinsing and a method for purifying the same, and more specifically, to a conventional thinner thinner, which can be replaced with a thinner of a mixed solvent, at the same time high yield and convenience of work process at the time of regeneration. The present invention relates to a thinner composition and a method for purifying the same, which can be improved to maximize economics and convenience in an industrial aspect.
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