http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101384277-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2007-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2014-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101384277-B1 |
| titleOfInvention | Mask Etch Plasma Reactor with Variable Process Gas Distribution |
| abstract | The plasma reactor for processing a workpiece such as a mask or wafer comprises a vacuum chamber with a cylindrical sidewall, a ceiling over the sidewall and a ring supporting the ceiling and supported at the upper edge of the sidewall, the ring having an outer surface. And an inner surface. An RF plasma source power applicator and an RF source power generator coupled to the applicator supply plasma source power. The plurality of passages extend radially through the ring from the outer surface to the inner surface and are spaced along the circumference of the ring. The process gas supply part supplies the process gas. An external gas flow conduit device outside the chamber extends around the circumference of the chamber and is coupled with the process gas supply. A plurality of outer gas flow valves outside of the chamber are coupled with the outer conduit at respective positions spaced along the conduit, the respective valves being (a) coupled with respective ones of the plurality of passages of the outer surface of the ring. Controlled gas output port and (b) valve control input. The gas valve configuration controller controls the valve control input of the respective valves. |
| priorityDate | 2006-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 17.