http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101379701-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f8dfd5447275bea4b74d914224d6f207 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32357 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32568 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02049 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2012-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_73e5a1ff674fa19de883874a43e1faee http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_508d21c30e0bfc63853a4870115b7feb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_95f69c651a481a9cf8da7e43504cfa71 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_755020d14d2e2a1f49d4c0bd868bd793 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fa0f4cdc61db64059193510ef37ffa24 |
| publicationDate | 2014-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101379701-B1 |
| titleOfInvention | Substrate processing apparatus and substrate processing method |
| abstract | The present invention provides a substrate processing apparatus and a substrate processing method. The substrate processing apparatus includes a chamber, an indirect plasma source for providing activated ammonia and activated hydrogen fluoride inside the chamber, and a direct plasma source for providing ion energy to a substrate disposed inside the chamber. . The direct plasma source may include a plurality of ground electrodes extending side by side in a first direction defined by a first direction vertically spaced from a plane on which the substrate is disposed and a second direction perpendicular to the first direction; And power source electrodes disposed between the ground electrodes and extending side by side in the first direction and powered by an RF power source to generate plasma between neighboring ground electrodes. Activated ammonia and activated hydrogen fluoride are provided on the substrate through the space between the power supply electrode and the ground electrode. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160018152-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101640094-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101577272-B1 |
| priorityDate | 2012-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 34.