http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101338771-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 |
| filingDate | 2010-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101338771-B1 |
| titleOfInvention | Operation method of substrate processing apparatus |
| abstract | Provided is a method of operating a substrate processing apparatus that can stably generate plasma, thereby suppressing generation of particles. After placing the substrate in the vacuum evacuated vacuum chamber, the rare gas is first supplied into the vacuum chamber, and a voltage is applied to the plasma generating means to generate a plasma of the rare gas. Subsequently, the reaction gas is supplied into the vacuum chamber, and the reaction gas is contacted with the plasma of the rare gas to generate a plasma of the reaction gas. The plasma of the reaction gas is brought into contact with the substrate to treat the substrate. Rather than converting the reaction gas into plasma by the plasma generating means, plasma is first generated, thereby stably generating plasma, and generation of particles is suppressed. |
| priorityDate | 2009-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 39.