http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101316954-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4586 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-683 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6831 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32724 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-458 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4581 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-458 |
| filingDate | 2009-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101316954-B1 |
| titleOfInvention | Substrate Support of Plasma Processing Equipment |
| abstract | A substrate support of a plasma processing apparatus for stably controlling a substrate at a relatively high temperature is provided. For that purpose, an electrostatic adsorption plate 14 having a first electrode for electrostatically adsorbing the substrate W, a second electrode for applying a bias to the substrate W, and a heater for heating the substrate, and an electrostatic adsorption plate A cylindrical flange 13 made of an alloy welded to the lower surface of (14) and having thermal properties equivalent to that of the electrostatic adsorption plate 14, and an O-ring 12 on the surface facing the lower surface of the flange 13 In the substrate support having the support 10 to which the flange 13 is attached through the O-ring 12, the temperature of the substrate W is made constant when the bias power applied to the substrate W is changed. The heater power for heating the substrate W is changed. |
| priorityDate | 2009-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.