http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101316054-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-16 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-08 |
| filingDate | 2009-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101316054-B1 |
| titleOfInvention | Composition for etching silicon oxide and method for etching silicon oxide using same |
| abstract | Provided are a composition for etching a silicon oxide film including hydrogen fluoride, an anionic polymer, and deionized water, and having a high etching selectivity of the silicon oxide film relative to the nitride film on a semiconductor substrate, and a method of etching the silicon oxide film using the same.n n n n Silicon oxide, etching, anionic polymer, nitride, etching selectivity |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102172305-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180121795-A |
| priorityDate | 2008-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 57.