http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101304408-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32192 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32229 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2012-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101304408-B1 |
| titleOfInvention | Plasma processing equipment |
| abstract | The plasma processing apparatus includes a processing container, a stage, a dielectric member, a means for introducing microwaves, an injector, and an electric field shield. The processing container is formed by partitioning a processing space therein. The stage is installed in a processing container. The dielectric member is provided to face the stage. The means for introducing microwaves introduces microwaves into the processing space via the dielectric member. The injector is made of a dielectric and has one or more through holes. The injector is composed of bulk dielectric material, for example. The injector has one or more through holes and is disposed inside the dielectric member. The injector is formed by partitioning a path for supplying the processing gas to the processing space together with the through hole formed in the dielectric member. The field shield covers the perimeter of the injector. |
| priorityDate | 2011-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 19.