http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101268615-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 |
| filingDate | 2009-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101268615-B1 |
| titleOfInvention | Polishing liquid for CPM and polishing method using the same |
| abstract | The polishing liquid for CMP according to the present invention contains abrasive grains, additives, and water, and an organic compound that satisfies predetermined conditions as an additive is blended. The polishing method according to the present invention is directed to a substrate having a silicon oxide film on the surface thereof, and is a step of polishing the silicon oxide film with a polishing pad while supplying the CMP polishing liquid between the silicon oxide film and the polishing pad. It is provided. |
| priorityDate | 2008-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 109.