http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101252062-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32422 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2010-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101252062-B1 |
| titleOfInvention | Photomask Plasma Etching Method and Apparatus |
| abstract | Provided herein are methods and apparatus for etching photomasks. In one embodiment, the apparatus includes a process chamber having a support pedestal adapted to receive a photomask. An ion-neutral shield is placed over the pedestal and a redirecting plate assembly is provided over the ion-neutral shield. While the deflector plate assembly defines the gas flow direction for the process gases facing the ion-neutral shield, the ion-neutral shield is used to establish the desired distribution of ions and neutral species in the plasma to etch the photomask. . |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11276561-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019078657-A1 |
| priorityDate | 2006-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.