http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101215367-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-0037 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-71 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32972 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32935 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-71 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-66 |
| filingDate | 2009-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2012-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2012-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101215367-B1 |
| titleOfInvention | Computer-readable media recording the etching apparatus, the analyzing apparatus, the etching processing method, and the etching processing program |
| abstract | Representative few wavelengths can be selected from waveforms at many wavelengths without setting information on substances and chemical reactions, thereby reducing the analysis of etching data that requires a large number of processes and efficiently monitoring etching. It is an etching apparatus which can set monitoring. Etching apparatus WHEREIN: The waveform change which determines the presence or absence of a change in the lot-wafer-step OES data retrieval-acquisition function 511 which acquires the light emission intensity waveform along the several etching process time-axis, and the some light emission intensity waveform. The presence / absence determination function 521, the waveform correlation matrix calculation function 522 for calculating the correlation matrix between the emission intensity waveforms, the waveform classification function 523 for classifying the emission intensity waveforms into groups, and the representative emission intensity waveforms from the group The representative waveform selection function 524 to select was provided. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10262842-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11410836-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015083328-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20220001603-A |
| priorityDate | 2009-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419593449 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24556 |
Total number of triples: 24.