http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101190804-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32816 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32834 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B7-0035 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2011-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2012-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2012-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101190804-B1 |
| titleOfInvention | Plasma treatment method |
| abstract | In the present invention, the Y 2 0 3 of the inner wall of the processing chamber or the components in the processing chamber. Provided is a plasma treatment method for suppressing or reducing foreign matters caused by a deteriorated layer on a surface. The present invention provides a plasma processing method using a plasma processing apparatus in which a material constituting an inner wall of a processing chamber or a component material in the processing chamber is made of yttria, the method comprising: placing a sample in the processing chamber and etching the sample; A deposit removal step of removing deposits deposited in the process chamber by a plasma using a gas containing fluorine or chlorine and a step of exposing the inside of the processing chamber after the deposit removal step to a rare gas plasma. It is a plasma processing method characterized by the above-mentioned. |
| priorityDate | 2010-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 19.