| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76835 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76808
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76814
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76826
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-768 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2008-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2012-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2012-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101179111-B1 |
| titleOfInvention |
Etching Methods and Storage Media |
| abstract |
An etching method for etching a fluorine-containing carbon film formed on a substrate by plasma includes a first step of etching by a plasma of a processing gas containing oxygen, and a second step of etching by a plasma of a processing gas containing fluorine. Has a step.n n n n Fluorine, plasma, oxygen, etching |
| priorityDate |
2007-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |