http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101156943-B1

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filingDate 2010-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2012-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2012-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101156943-B1
titleOfInvention Inductively Coupled Plasma Treatment Equipment
abstract The present invention provides an inductively coupled plasma processing apparatus that can cope with an increase in size of a substrate to be processed. The inductively coupled plasma processing apparatus includes a processing chamber 4 which accommodates a substrate to be processed and performs a plasma processing, a mounting table 23 on which the substrate G is mounted in the processing chamber 4, and a processing chamber 4. The processing gas supply system 20 for supplying gas, the exhaust system 30 for evacuating the inside of the processing chamber 4, the high frequency antenna 13 for forming an induction field in the processing chamber 4, and the high frequency antenna 13. A nonmagnetic material and conductive material having a first high frequency power supply 15 for supplying high frequency power and insulated from the main body container 1 constituting the processing chamber 4 between the high frequency antenna 13 and the processing chamber 4. The metal window 2 is formed.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102136925-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180069774-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101870483-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101867147-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150009445-A
priorityDate 2009-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 33.