http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101155372-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-167 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A46B13-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61J9-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2005-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2012-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2012-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101155372-B1 |
| titleOfInvention | Positive resist composition for electron beam, EL light or X-ray and pattern formation method using the same |
| abstract | (A) at least one compound that generates an acid by actinic radiation or radiation treatment; And (B) a positive resist composition for an electron beam, EUV light or X-ray, comprising a resin in which solubility in an alkaline developer is increased by the action of an acid, wherein (B) the resin has an alicyclic group linked to a fluorine-substituted alcohol residue. Positive resist composition for electron beam, EUV light or X-ray containing a unit; And a pattern formation method using this composition. |
| priorityDate | 2004-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 180.