http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101153616-B1

Outgoing Links

Predicate Object
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2221-6834
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-30105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2221-68354
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6835
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
filingDate 2006-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2012-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2012-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101153616-B1
titleOfInvention Method for manufacturing semiconductor chip and semiconductor chip
abstract Plasma etching to a second surface of a semiconductor wafer having a first surface having an insulating film disposed in the divided region and a second surface disposed on an opposite side of the first surface and having a mask for determining the divided region. By removing the portions corresponding to the divided regions, the insulating film is exposed from the etching bottom, and then the exposed surface of the insulating film is charged by charge due to ions in the plasma. In the manufacturing method which removes the corner part which contact | connects the insulating film in an element formation area | region by continuing plasma etching in the set state, an isotropic etching is performed with respect to the said semiconductor wafer at some timing. do.
priorityDate 2005-04-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419546198
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419522015
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6373
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24547
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419527022
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID17358
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3084099
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419546607

Total number of triples: 29.