http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101144233-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-335 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-34 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2009-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2012-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2012-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101144233-B1 |
| titleOfInvention | Method and apparatus for pretreatment of roll-to-roll sputtering apparatus |
| abstract | The pre-processing method of the roll-to-roll sputtering apparatus according to the present invention comprises the steps of applying a radio frequency (RF) power to the guide roller formed electrode; Injecting gas into the housing; Ionizing the injected gas into a plasma state by the RF power; And adsorbing and removing foreign substances on the surface of the flexible film by colliding with the flexible film wound on the guide roller.n n n The pretreatment method using the sputtering method according to the present invention has an effect of excellent pretreatment efficiency, less loss of the surface of the film by plasma, and improved adhesion during thin film deposition after the pretreatment step.n n n n Plasma, sputtering, radio frequency (RF), pre-treatment |
| priorityDate | 2009-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 20.