http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101142631-B1

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028
filingDate 2007-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2012-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2012-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101142631-B1
titleOfInvention Photosensitive resin composition and sand film photoresist for sand blast resist
abstract BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photosensitive resin composition for sandblast resists, wherein the photosensitive resin composition for sandblast resists comprising a binder resin, a photopolymerizable monomer and a photopolymerization initiator is a binder resin and a cellulose-based resin and an acrylic resin are 1-40: 60-. By mixing and using a weight ratio of 99, it is possible to provide a photosensitive resin composition for sandblast resist having excellent adhesion and suitable for use as a barrier material of a lead-free material and having an appropriate sandblast resistance and a peeling time. It can be used to provide environmentally friendly dry film resist.n n n n Sandblast, resist, adhesion, acrylic resin
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11681330-B2
priorityDate 2007-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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