http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101077106-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S438-914 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68792 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 |
| filingDate | 2007-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2011-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2011-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101077106-B1 |
| titleOfInvention | Manufacturing Method of Substrate Processing Apparatus and Semiconductor Device |
| abstract | The substrate processing apparatus according to the present invention hermetically closes the opening of the reaction container by abutting a reaction vessel for processing a substrate and a first seal member and a second seal member at one end of the opening side of the reaction vessel. A first gas flow path formed in a region between the first seal member and the second seal member by contacting the seal cap with the seal cap and the reaction vessel; and the first gas flow path provided in the seal cap. And a second gas flow passage communicating with the reaction vessel, a first gas supply port provided in the reaction vessel and supplying a first gas to the first gas flow passage, and provided in the reaction vessel, A second gas supply port for supplying two gases, the front end opening being in a communicating portion of the first gas supply port with the first gas flow path, and the first gas with the second gas flow path; A base end opening in the connecting part to have, in the positions away from each other in the facing state each said seal cap to the reaction vessel. n n Gas supply port, gas flow path, seal cap |
| priorityDate | 2006-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 40.