http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100984422-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32422 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2007-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2010-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2010-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100984422-B1 |
| titleOfInvention | Method and apparatus for photomask plasma etching |
| abstract | The present invention provides a method and apparatus for etching a photomask. In one embodiment, the apparatus includes a process chamber having a support pedestal configured to receive a photomask. The ion-neutral shield is placed over the pedestal and the deflector plate assembly is provided over the ion-neutral shield. The deflector plate assembly defines a gas flow direction for producing gas towards the ion-neutral shield, which is used to establish a desired distribution of ions and neutral species in the plasma to etch the photomask. |
| priorityDate | 2006-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.