http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100976031-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate | 2004-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2010-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2010-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100976031-B1 |
| titleOfInvention | Radiation-sensitive resin composition, interlayer insulating film and microlens and manufacturing method thereof |
| abstract | The present invention has a (A) acetal structure and / or a ketal structure, and an epoxy structure, a high molecular weight polystyrene equivalent weight average molecular weight of 2,000 or more measured by gel permeation chromatography, and (B) irradiation with pKa. The radiation sensitive resin composition containing the compound which produces | generates the acid whose number is 4.0 or less is provided. This composition has a high radiation sensitivity, good storage stability, a developing margin capable of forming a good pattern shape even when exceeding an optimum developing time in the developing step, and easily a patterned thin film excellent in adhesion. It can be formed so as to form an interlayer insulating film having a high transmittance and a low dielectric constant, and a microlens having a high transmittance and a good melt shape.n n n n Radiation-sensitive resin composition, radiation sensitivity, interlayer insulation film, micro lens, acetal structure, ketal structure, epoxy structure |
| priorityDate | 2003-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 416.