http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100959659-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32972 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32935 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-68 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2008-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2010-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2010-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100959659-B1 |
| titleOfInvention | Plasma Treatment Equipment |
| abstract | In the plasma processing apparatus for measuring the etching amount of the workpiece by optical interference on the surface of the workpiece, the end point of etching is determined. It is possible to improve the processing accuracy by etching amount detection.n n n The detector for detecting light from the surface of the workpiece through a shower plate in a plasma processing apparatus that generates a plasma between the shower plate and the lower electrode to process the workpiece, includes: a light introduction portion comprising a light transmission body through which light is input; A spectroscope for analyzing the light obtained from the light introduction section is provided, and the cross section through which the light introduction section is input has a distance of at least five times the average free process of the gas molecules in the vacuum vessel from the cross section on the plasma side of the shower plate. Are placed. |
| priorityDate | 2007-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 17.