| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-345
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-5096
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0217
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3185 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2005-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2010-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2010-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-100954254-B1 |
| titleOfInvention |
Tensile and compressive stress materials for semiconductors |
| abstract |
A stressed film is formed on the substrate. The substrate is disposed in the process region and a plasma is formed from the process gas provided in the process region, the process gas having a silicon-containing gas and a nitrogen-containing gas. Diluent gas, such as nitrogen, may be added. The stressed material in the initial deposition state may be exposed to ultraviolet radiation or electron beams to increase the stress value of the deposited material. Additionally or alternatively, nitrogen plasma treatment may be used to increase the stress value of the material during deposition. Pulsed plasma methods for depositing stressed materials are also described. |
| priorityDate |
2004-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |