http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100935144-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2443 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2431 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2443 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2431 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2406 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2007-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2010-01-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2010-01-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100935144-B1 |
| titleOfInvention | Plasma processing device |
| abstract | An object of this invention is to provide the plasma processing apparatus of the simple structure which can process the to-be-processed surface of a workpiece | work in a short time.n n n As a means for solving the said subject, the plasma processing apparatus 1 of this invention has the workpiece installation which installs the 1st electrode 2 which has the hollow part 40 which penetrated from the upper end to the lower end, and the workpiece | work 10. The outer peripheral side of the opening part 422 of the lower end side of the hollow part 40 and the 2nd electrode 3 arrange | positioned facing the lower end of the 1st electrode 2 via the part 100, the workpiece | work installation part 100, and the hollow part 40. FIG. A power supply circuit 7 including a processing gas ejection part 5 formed in the circumferential direction, a power supply 72 for applying a voltage between the first electrode 2 and the second electrode 3, and a processing gas. It is provided with the gas supply means 8 which supplies the process gas for plasma generation to the blowing part 5, and applies a voltage between the 1st electrode 2 and the 2nd electrode 3, 5), the processing gas present in the vicinity of the opening 422 is activated to generate a plasma, and the plasma to treat the target surface 101 of the workpiece 10 by the plasma. It is configured to handle rasmas.n n n n 1st electrode, 2nd electrode, a workpiece | work, a workpiece | work installation part, a processing gas blowing part, a power supply circuit, a gas supply means, the to-be-processed surface of a workpiece | work, a plasma processing apparatus |
| priorityDate | 2006-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 21.