http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100883875-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32623 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3266 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J27-16 |
| filingDate | 2003-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2009-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2009-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100883875-B1 |
| titleOfInvention | Magnetic Plasma Controlled Capacitively Coupled Plasma Reactor |
| abstract | The plasma reactor includes a side wall and a ceiling defining a vacuum chamber and a workpiece support in the chamber and facing the ceiling to support a workpiece on a plane, wherein the workpiece support and the ceiling together form an area between the workpiece support and the ceiling. It includes a vacuum enclosure that partitions the processing area. The process gas inlet supplies the process gas into the chamber. A plasma power supply electrode is connected to an RF power generator that electrostatically couples the plasma power supply into the chamber to maintain the plasma in the chamber. The reactor further includes a first overhead solenoid electromagnet, the overhead solenoid electromagnet, the ceiling, the sidewall and the workpiece support located at least along the common axis of symmetry. A current source is connected to the first overhead solenoid electromagnet to supply a first current to the first overhead solenoid electromagnet thereby creating a magnetic field in the chamber that is a function of the first current, wherein the first current is A magnetic field has a value that increases the uniformity of the plasma ion density radial distribution with respect to the axis of symmetry near the surface of the workpiece support.n n n n Plasma reactor, vacuum chamber, vacuum enclosure, RF power generator |
| priorityDate | 2002-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 21.