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filingDate 2002-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2009-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2009-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100883291-B1
titleOfInvention Organic Anti-Reflection Plasma Etching Method
abstract Semiconductor fabrication process for etching organic antireflective films using O 2 -free sulfur containing gas which minimizes the lateral etch rate of the top photoresist to provide selectivity to the bottom film and / or to maintain the critical dimensions defined by the photoresist Initiate. The etching gas may include SO 2 , a carrier gas such as Ar or He, and other optional gas such as HBr. This process is useful for etching contacts or via openings of 0.25 microns or less in forming structures such as damascene structures.n n n n Organic antireflection film, etching gas, damascene structure
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