| abstract |
The present invention provides a novel radiation-sensitive acid generator having a structure of Formula 1i. When the radiation-sensitive acid generator is used in a chemically amplified radiation-sensitive resin composition, the radiation-sensitive acid generator has high transparency and relatively high flammability and has no problem in human accumulation, and the acidity and boiling point of acid generated High, the diffusion length in the resist film is moderately short, and the dependence on the mask pattern density is low.n n n <Formula 1i>n n n n n n n n In the formula, R represents a monovalent organic group, nitro, cyano group or hydrogen atom having a fluorine content of 50% by weight or less, and Z 1 and Z 2 are each independently a fluorine atom or a linear or branched carbon atom having 1 to 10 carbon atoms. Perfluoroalkyl group is represented.n n n n Acid generator, radiation sensitive resin composition, alkali soluble resin, sulfonic acid |