http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100844958-B1

Outgoing Links

Predicate Object
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28061
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823835
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823842
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336
filingDate 2007-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2008-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2008-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100844958-B1
titleOfInvention A semiconductor device having a double diffusion barrier and a method of manufacturing the same
abstract SUMMARY OF THE INVENTION The present invention provides a gate having a diffusion barrier capable of satisfying the gate contact resistance value Rc and the sheet resistance value Rs at the same time, and a manufacturing method thereof. The semiconductor device of the present invention is a polysilicon electrode and a tungsten electrode. The diffusion barrier provided therebetween is a Ti / WN x / TiN x diffusion barrier and a tungsten silicide layer stacked on the titanium (Ti) in the order of the first nitrogen-containing tungsten film (WN x ) and the nitrogen-containing titanium film (TiN x ). WSi x ) is made of a combination of WSi x / WN x diffusion barriers in which a second nitrogen-containing tungsten film (WN x ) is stacked on top of the gate contact resistance due to titanium (Ti) of Ti / WN x / TiN x diffusion barriers. The reduction of the value and the reduction of the gate sheet resistance value by the tungsten silicide film (WSi x ) of the WSi x / WN x diffusion barrier can be realized simultaneously.n n n n Gate stack, sheet resistance, contact resistance, tungsten silicide film, titanium film, diffusion barrier
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10686122-B2
priorityDate 2006-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100662850-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20000009254-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5462311
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID16212546
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419518429
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID222
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419545355
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23963
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419524915
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559585
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID82895
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID425762086
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556970
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24404
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415776239
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6336889
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419520437
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID407330845
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID522684
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5352426
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID947
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559477
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID61330
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3084169
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23964
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419579030
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559532
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419526467

Total number of triples: 42.