http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100793527-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01F17-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3105 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate | 1998-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2008-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2008-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100793527-B1 |
| titleOfInvention | abrasive |
| abstract | According to the present invention, at least one of the abrasive grains having two or more crystallites having a grain boundary or having cerium oxide particles and pores having a bulk density of 6.5 g / cm 3 or less for polishing a surface to be polished such as a SiO 2 insulating film at a high speed without defect. Provided are an abrasive comprising a slurry in which one is dispersed in a medium, a method of polishing a substrate using the abrasive, and a method of manufacturing a semiconductor device.n n n Grain boundaries, bulk density, cerium oxide particles, abrasives, particle diameters, crystallite diameters, slurries |
| priorityDate | 1997-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 40.