| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_421cadb30fc0074fe61126eb980d19d6 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-327
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3211
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-1825 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32963
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32981
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32917
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67242
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32192
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32926
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3299
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32935 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2006-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2007-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abc363a8f4c9db9f6582fba13b7e47a5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50782dd8f62fecb777ea4d9cbe033593
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c58821d91527cdf4e24633049cb79b85
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_982438128fc033c76405c8a1618eaf31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_26e223a62e166f9a2183b2a58ded92b2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_343c4ed5ad65dbde14b6ec009aaa0cbb |
| publicationDate |
2007-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-100780021-B1 |
| titleOfInvention |
Plasma treatment method and plasma treatment apparatus |
| abstract |
The present invention determines the end point of the tamping discharge after wet cleaning with high accuracy in a versatile manner.n n n A plasma processing container (101) having an antenna electrode (102) and a lower electrode (109) for mounting and holding a sample in the processing container (101), a gas supply device for supplying a processing gas into the processing container (101); An exhaust pump 116 for exhausting the gas in the processing vessel via the exhaust valve 115, and supplying high frequency power to the antenna electrode 102 via the matching unit 105, by means of a magnetic field coil 107. In the plasma processing method in which a plasma is generated in the processing container 101 in which a magnetic field is formed and plasma processing is performed on the sample 108 mounted on the lower electrode 109, the plasma is repeatedly processed for a plurality of samples. The pressure in the processing vessel 101 during the process is detected, and when the detected pressure decreases with an increase in the plasma processing time and reaches a stable value, it is determined that the break-in discharge is finished. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101604844-B1 |
| priorityDate |
2006-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |