http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100778244-B1
Outgoing Links
Predicate | Object |
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classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D471-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate | 2002-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2007-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2007-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-100778244-B1 |
titleOfInvention | Organic Anti-reflective Film for ArF Photoresist and Manufacturing Method Thereof |
abstract | The present invention provides an organic anti-reflective coating composition for ArF photoresists comprising a light absorber represented by the following formula (1) capable of forming an undercoat layer that effectively reduces the adverse effects of reflection from a background substrate in a photolithography process using various radiations; An organic antireflection film for ArF photoresist using this composition and a method of manufacturing the same are provided.n n n [Formula 1]n n n n n n n n In Formula 1, each R is independently or simultaneously hydrogen; Hydroxyl group; halogen; Nitro group; Amino group; An alkyl group having 1 to 8 carbon atoms containing or without a hydroxyl group; An alkoxy group having 1 to 8 carbon atoms containing or without a carbonyl group; benzene; Cycloalkyl having 5 to 6 carbon atoms; Arylalkyl; Or alkylaryl, at least one of which is not hydrogen.n n n Light absorber, organic antireflection film, photolithography, photoresist, resolution |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019173074-A3 |
priorityDate | 2002-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 72.