http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100778243-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2002-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2007-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2007-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100778243-B1 |
| titleOfInvention | Organic Anti-reflective Film for ArF Photoresist and Manufacturing Method Thereof |
| abstract | The present invention provides an organic anti-reflective coating composition for ArF photoresists comprising a light absorber represented by the following formula (1) capable of forming an undercoat layer that effectively reduces the adverse effects of reflection from a background substrate in a photolithography process using various radiations; An organic antireflection film for ArF photoresist using this composition and a method of manufacturing the same are provided.n n n [Formula 1]n n n n n n n n In formula 1, X is hydrogen or methyl; R 1 to R 15 are at least one of these hydroxyl groups, and the others are each independently or simultaneously hydrogen; halogen; Nitro group; Amino group; An alkyl group having 1 to 3 carbon atoms containing or without a hydroxyl group; An alkoxy group having 1 to 3 carbon atoms, which may or may not contain a carbonyl group; benzene; Or cycloalkyl having 5 to 6 carbon atoms.n n n Light absorber, organic antireflection film, photolithography, photoresist, resolution |
| priorityDate | 2002-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 72.