http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100744115-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2005-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2007-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2007-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100744115-B1 |
| titleOfInvention | Processing Method of Semiconductor Substrate Using Polluted Condition Feedback of Chamber |
| abstract | Provided is a method of processing a semiconductor substrate, which can process the semiconductor substrate constantly regardless of the contamination state of the chamber. According to the method of processing a semiconductor substrate according to the present invention, the contamination state of the chamber is measured before processing each semiconductor substrate, and the contamination state of the chamber is fed back so that the contamination state affects the process conditions for processing each semiconductor substrate. Process conditions can be changed to counteract the effects. According to this, the reliability of the semiconductor processing can be increased, and the yield for the product can be improved. |
| priorityDate | 2005-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 14.