http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100741296-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate | 2005-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2007-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2007-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100741296-B1 |
| titleOfInvention | Photoresist composition |
| abstract | The present invention relates to a photoresist composition, in particular a) 10 to 27% by weight of a polymer resin containing an acrylate-based resin and a novolak resin having a glass transition temperature of 150 ° C. or lower; b) 3 to 8% by weight of the diazide photosensitive compound; And c) relates to a photoresist composition and a dry film resist using the same comprising a residual amount of the organic solvent.n n n The photoresist composition of the present invention can be used in the form of a dry film, including an acrylate-based resin having a high dissolution rate of low glass transition temperature as a polymer resin, and an acrylate having excellent pattern forming ability and low glass transition point Due to the increased flexibility, the adhesion to the plastic substrate is very good, making it particularly suitable for forming transparent electrodes of displays.n n n Photoresist |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9343553-B2 |
| priorityDate | 2005-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 116.