http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100723088-B1

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filingDate 2005-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2007-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2007-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100723088-B1
titleOfInvention Method for manufacturing semiconductor device
abstract A mask material forming step of forming a mask material on a substrate; a concave part forming step of patterning the mask material in a predetermined shape to form a concave part in the mask material; a positioning step of arranging a functional liquid in the concave part; A step of drying the functional liquid disposed in the concave portion; an annealing (baking) of a functional film formed by the drying step; and a step of removing the mask material to form a dummy gate pattern made of the constituent material of the functional liquid And a pattern forming step of forming a pattern.
priorityDate 2004-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 28.