http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100557616-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2000-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2006-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2006-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100557616-B1 |
| titleOfInvention | Photoresist polymer for resist flow process and photoresist composition containing the same |
| abstract | The present invention relates to a method of forming a photoresist resin, a photoresist composition and a contact hole using the same for a resist flow process, wherein the photoresist polymer of Chemical Formula 1 has excellent physical properties as a photoresist as well. When used in combination with a polymer having different physical properties, it shows even better flow characteristics. Therefore, the photoresist composition including the polymer of Formula 1 and a mixed resin thereof may be usefully applied to a resist flow process.n n n [Formula 1]n n n n n n n n Wheren n n R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , a, b and c are as defined in the specification. |
| priorityDate | 2000-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 74.