| abstract |
The present invention provides a polymer having a repeating unit represented by the following formula (1), and a chemically amplified positive photoresist material having high sensitivity, high resolution, and high heat resistance as a main component thereof.n n n n n n n n n n Wherein R 1 , R 2 and R 3 are each independently a hydrogen atom or a methyl group, R 4 is a hydrogen atom, an alkyl group or an alkoxy group, and R 5 , R 6 , and R 7 are each independently a hydrogen atom, a methyl group, An ethyl group, a t-butyl group, a tetrahydropyranyl group or an alkoxy methylene group, an integer of j = 1 to 8, k = 0 to 8, and l, m and n each represent a repeating unit, and l + m + n is one.n n n The resist produced in the present invention has high sensitivity, high resolution, and high heat resistance to radiation such as far ultraviolet rays and KrF excimer laser. |