http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100530629-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/E04F2201-04 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/E04F15-024 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/E04F15-203 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2000-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2005-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2005-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100530629-B1 |
| titleOfInvention | Photosensitive Acrylic Resin composition for PS |
| abstract | The present invention relates to an acrylate-based photosensitive resin composition for PS plates, more specifically, an acrylic binary copolymer composed of tetrahydrofurfuryl methacrylate and hydroxylethyl methacrylate as a basic resin, A tertiary copolymer obtained by ester-bonding zoquinone sulfonyl chloride directly to the main chain is used as a photosensitive resin, and the polymer used has the form of a tertiary copolymer of acrylate. The acrylate-based photosensitive resin composition for PS plates according to the present invention firstly has excellent solubility, sensitivity and resolution in a solvent as a PS plate photosensitive material, shows excellent dot reproducibility and developability, and secondly, due to excellent dot retention, More than 50,000 copies can be printed and production costs are low. |
| priorityDate | 2000-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 54.