http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100500750-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 1996-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2006-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2006-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100500750-B1 |
| titleOfInvention | Chemically Amplified Positive Photoresist |
| abstract | The present invention relates to a photoresist composition comprising a resin binder (1), an acid generator (2) and a luminous flux control agent (3) containing photoacid labile groups. The photoresist of the present invention exhibits excellent luminous flux and can provide small, high resolution relief images, wherein the sidewalls are at least essentially vertical and have lines of 1 μm or less and lines of 1/2 μ or less. The present invention also relates to a method comprising the luminous flux control of the photoresist composition. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150035867-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101967193-B1 |
| priorityDate | 1995-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 131.