http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100473806-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-228 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-243 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-12 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20 |
| filingDate | 2002-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2005-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2005-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100473806-B1 |
| titleOfInvention | Method and apparatus using large area organic vapor deposition for organic thin film and organic devices |
| abstract | The present invention provides a large-area organic vapor deposition apparatus and manufacturing method for organic thin film and organic device. Organic vapor deposition apparatus according to the consistent point of the present invention comprises a vapor deposition portion and a source part (source part), the vapor deposition portion is a reaction chamber, a substrate support for supporting a substrate installed in the reaction chamber, substrate support A showerhead installed at the substrate to control the temperature of the substrate, and a showerhead disposed in the reaction chamber opposite the substrate support to uniformly distribute the organic source gas phase onto the substrate to participate in the deposition reaction. a source chamber for generating an organic source gaseous phase to be provided to the shower head, and a source chamber surrounding the source chamber to allow the organic source gaseous to be vaporized from the organic material in the source chamber and to the flow controller. Heating and control valves of the feed gas, diluent gas, organic source gaseous phase which are controlled and supplied by The heating unit comprises a heating unit, a transfer gas source for providing a transfer gas for transferring the organic source gaseous phase to the reaction chamber, and a dilution gas source. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9349992-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10509145-B2 |
| priorityDate | 2002-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.