http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100430445-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4407 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67253 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
| filingDate | 2001-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2004-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2004-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100430445-B1 |
| titleOfInvention | Processing apparatus having particle counter and cleaning device, cleaning method, cleanliness diagnosis method and semiconductor fabricating apparatus using the same |
| abstract | The dry gas injection nozzle 5 and the exhaust duct 7 for exhausting the dry gas in the chamber 9 are provided in the lid member 1 for opening and closing the chamber. Dry gas is injected into the chamber (9) and the internal pressure in the chamber (9) is reduced to blow up the particles remaining in the chamber and to count the blown up particles while the called particles are discharged to the exhaust duct (7). Exhaust through. |
| priorityDate | 2000-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 20.