http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100417926-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S156-914 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32559 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F4-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 1997-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2004-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2004-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100417926-B1 |
| titleOfInvention | Plasma Etching Electrode |
| abstract | Disclosed is an electrode for plasma etching which is inexpensive and capable of reducing generation of dust and maintaining a high-performance electrode. The electrode includes a portion consumed by the plasma and the rest, wherein the portion consumed by the plasma is formed of a metallic material such as silicon or glass, and the remaining portion is formed of a carbon material coated with a film of glassy carbon material. |
| priorityDate | 1996-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 21.